5 Dokumente gefunden
Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm
Recent advancements in photonics have intensified the performance requirements for optical systems and present significant challenges for optical coating technologies. Conventional interference coating systems often prove to be insufficient, especially in applications requiring large angles of light…
Basel: MDPI, 2025-05-06
Linear and Nonlinear Optical Properties of Iridium Nanoparticles Grown via Atomic Layer Deposition
Nonlinear optical phenomena enable novel photonic and optoelectronic applications. Especially, metallic nanoparticles and thin films with nonlinear optical properties offer the potential for micro-optical system integration. For this purpose, new nonlinear materials need to be continuously identified,…
Basel: MDPI, 2023-04-18
Spectrophotometric Characterization of Thin Semi-Transparent Aluminum Films Prepared by Electron Beam Evaporation and Magnetron…
Aluminum thin films with thicknesses between approximately 10 and 60 nm have been deposited by evaporation and sputtering techniques. Layer characterization focused on reflectance, optical constants, and surface quality. Reflectance fits have been performed using a merger of three standard dispersion…
Basel: MDPI, 2022-09-01
Direct growth of monolayer MoS 2 on nanostructured silicon waveguides
aus: Nanophotonics
We report for the first time the direct growth of molybdenum disulfide (MoS 2 ) monolayers on nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of utilizing the Chemical Vapour Deposition (CVD) on nanostructured photonic devices in a scalable process. Direct growth…
Berlin: De Gruyter, 2022-08-22
Influence of substrate materials on nucleation and properties of iridium thin films grown by ALD
Ultra-thin metallic films are widely applied in optics and microelectronics. However, their properties differ significantly from the bulk material and depend on the substrate material. The nucleation, film growth, and layer properties of atomic layer deposited (ALD) iridium thin films are evaluated on…
Basel: MPDI, 2021-02-02