The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be tackled…
Illumination with LEDs is of increasing interest in imaging and lithography. In particular, compared to lasers, LEDs are temporally and spatially incoherent, so that speckle effects can be avoided by the application of LEDs. Besides, LED arrays are qualified due to their high optical output power. However,…
In dieser Arbeit werden innovative Beleuchtungssysteme in den Bereichen Mikroskopie und Lithographie untersucht. Dabei werden LEDs und LED-Arrays als Lichtquellen der Beleuchtungssysteme in zwei optischen Systemen eingesetzt, nämlich der Fourier-Ptychographie und dem Lau-Effekt. Es wird theoretisch analysiert…