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In situ controlled heteroepitaxy of single-domain GaP on As-modified Si(100)

Metalorganic vapor phase epitaxy of III-V compounds commonly involves arsenic. We study the formation of atomically well-ordered, As-modified Si(100) surfaces and subsequent growth of GaP/Si(100) quasisubstrates in situ with reflection anisotropy spectroscopy. Surface symmetry and chemical composition…
Melville: AIP Publ., 2015-12-30