Ion irradiation can cause burrowing of nanoparticles in substrates, strongly depending on the material properties and irradiation parameters. In this study, it is demonstrated that the sinking process can be accomplished with ion irradiation of cube‐shaped Ag nanoparticles on top of silicon; how ion…
Focused ion beam (FIB) processing with low-energy ions has become a standard technique for the manipulation of nanostructures. Many underlying ion beam effects that deviate from conventional high-energy ion irradiation of bulk systems are considered today; however, ion channeling with its consequence…
Nanotechnology is a buzzword in context of the proceeding miniaturization of devices and their components. Nanoparticles (NPs) can nowadays easily be synthesized from different material compositions by different chemical and physical processes. However, most of these techniques work close to or at the…
Doping of nanostructures, in particular semiconductor nanowires, during their synthesis is remarkably difficult due the strict control of process conditions required. Ion beam irradiation is a viable alternative as dopant incorporation it is not inherently limited by chemical potentials. However, in…
Ionenstrahlimplantation ist eine nützliche und weit verbreitete Methode um Materialien zu dotieren. Nanostrukturen verhalten sich unter Ionenbestrahlung oft deutlich anders als das entsprechende Volumenmaterial; zum Beispiel unterscheiden sich die erzeugten Dotierprofile sowie die Erzeugung und das Ausheilen…