3 Dokumente gefunden

Ion beam etching process simulation for the pattern transfer of photoresist diffraction gratings generated by holography

The manufacturing process for diffraction gratings based on interference lithography results at first in a resist surface relief pattern. However, the majority of applications demand grating structures in the inorganic substrate material itself. Commonly, a modification of the grating profile with regard…

Streulichtarme holografische Blaze-Gitter für den EUV-Bereich

Die physikalisch-optischen Randbedingungen beim Einsatz von Beugungsgittern im Wellenlängen-Bereich um 13,5nm bedingen einen großen Einfallswinkel. Die gebeugte Strahlung hinter einem solchen Grazing-Incidence-Gitter wird dabei an einer wesentlich größeren Fläche umgelenkt, als dies bei üblichen Anwendungen…

Imaging gratings with modulated blaze - realized by a combination of holography and reactive ion beam etching

Blazed gratings are in general the best choice for achieving the maximal diffraction efficiencies in a moderate wide wavelength band. However, a number of applications such as typical spectrometer systems need a broader spectral range. Here the drop of diffraction efficiency for the employed order towards…