Optical properties of black silicon structures ALD-coated with Al 2 O 3

GND
1299766145
ORCID
0000-0002-5181-9919
Affiliation
Institute of Applied Physics, Abbe Center of Photonics,Friedrich Schiller University Jena ,Germany
Schmelz, David;
GND
1299771432
Affiliation
Institute of Applied Physics, Abbe Center of Photonics,Friedrich Schiller University Jena ,Germany
Gerold, Kristin;
GND
1299772943
Affiliation
Institute of Applied Physics, Abbe Center of Photonics,Friedrich Schiller University Jena ,Germany
Käsebier, Thomas;
GND
1299775497
Affiliation
Institute of Applied Physics, Abbe Center of Photonics,Friedrich Schiller University Jena ,Germany
Sergeev, Natali;
GND
121634955X
ORCID
0000-0003-2055-2825
Affiliation
Institute of Applied Physics, Abbe Center of Photonics,Friedrich Schiller University Jena ,Germany
Szeghalmi, Adriana;
GND
12173854X
ORCID
0000-0002-3980-6971
Affiliation
Institute of Applied Physics, Abbe Center of Photonics,Friedrich Schiller University Jena ,Germany
Zeitner, Uwe D.

Atomic layer deposited (ALD) Al 2 O 3 coatings were applied on black silicon (b-Si) structures. The coated nanostructures were investigated regarding their reflective and transmissive behaviour. For a systematic study of the influence of the Al 2 O 3 coating, ALD coatings with a varying layer thickness were deposited on three b-Si structures with different morphologies. With a scanning electron microscope the morphological evolution of the coating process on the structures was examined. The optical characteristics of the different structures were investigated by spectral transmission and reflection measurements. The usability of the structures for highly efficient absorbers and antireflection (AR) functionalities in the different spectral regions is discussed.

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