Electrodeposition of cuprous oxide on a porous copper framework for an improved photoelectrochemical performance

Category

Published in:

Journal of materials science
Vol. 56, No. 20 (09.04.2021)Art.-No.:S. 11866-11880

Volume:

56

No.:

20

Date Created:

24.03.2022

Date Issued:

09.04.2021

DOI:

10.1007/s10853-021-06058-y

PPN:

1754723772

Language:

English

Type of Resource:

Text

Extent:

15 Seiten

DDC subject of DNB:

670 Manufacturing

Hosting institution:

Technische Universität Ilmenau, Fakultät für Elektrotechnik und Informationstechnik