Hard X‐ray wavefront correction via refractive phase plates made by additive and subtractive fabrication techniques

Affiliation
Deutsches Elektronen-Synchrotron DESY
Seiboth, Frank;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Brückner, Dennis;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Kahnt, Maik;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Lyubomirskiy, Mikhail;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Wittwer, Felix;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Dzhigaev, Dmitry;
GND
1222628031
ORCID
0000-0003-3906-6333
Affiliation
Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Albert-Einstein-Strasse 15, 07745Jena, Germany
Ullsperger, Tobias;
GND
121566366
ORCID
0000-0002-2919-2662
Affiliation
Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Albert-Einstein-Strasse 15, 07745Jena, Germany
Nolte, Stefan;
Affiliation
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute
Koch, Frieder;
Affiliation
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute
David, Christian;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Garrevoet, Jan;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Falkenberg, Gerald;
Affiliation
Deutsches Elektronen-Synchrotron DESY
Schroer, Christian G.

Modern subtractive and additive manufacturing techniques present new avenues for X‐ray optics with complex shapes and patterns. Refractive phase plates acting as glasses for X‐ray optics have been fabricated, and spherical aberration in refractive X‐ray lenses made from beryllium has been successfully corrected. A diamond phase plate made by femtosecond laser ablation was found to improve the Strehl ratio of a lens stack with a numerical aperture (NA) of 0.88 × 10 −3 at 8.2 keV from 0.1 to 0.7. A polymer phase plate made by additive printing achieved an increase in the Strehl ratio of a lens stack at 35 keV with NA of 0.18 × 10 −3 from 0.15 to 0.89, demonstrating diffraction‐limited nanofocusing at high X‐ray energies.

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License Holder: © 2020 Frank Seiboth et al. Journal of Synchrotron Radiation published by IUCr Journals.

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This publication is with permission of the rights owner freely accessible due to an Alliance licence and a national licence (funded by the DFG, German Research Foundation) respectively.