Die Mikro- und Nanofabrikation verspricht für die nächsten Jahre ein enormes Wachstumspotenzial, insbesondere auch im Bereich der laserbasierten Fertigung. Die hochauflösende Technik des Laserschreibens mittels Zwei-Photonen-Absorption (2PA) kann zur Herstellung von dreidimensionalen Bauteilen mit minimalen Strukturbreiten von sub-100 nm verwendet werden. Mit der optischen Präzision gehen auch Forderungen an die Präzision der Mess- und Positioniersysteme einher, um den technischen Stand von zweiphotonenbasiertem Laserschreiben weiter voranzutreiben. Die an der TU Ilmenau entwickelten Nanopositionier- und Nanomessmaschinen (NPM-Maschinen) ermöglichen eine hochgenaue und metrologisch rückführbare Positionierung mit Positionierauflösungen von 0,1 nm und einer Wiederholbarkeit von unter von 1 nm. Dabei eröffnet der Positionierbereich von 25 mm × 25 mm × 5mm bzw. von 200 mm × 200 mm × 25 mm der NPM-Maschinen ganz neue Dimensionen der skalenübergreifenden Fabrikation, sodass mikro- und sub-mikrometergenaue Artefakte bei Bauteilen mit Millimeterabmessungen erzielt werden können.
Micro- and nanofabrication are promising technologies, especially in the field of laserbased manufacturing. The high-resolution technique of laser writing by means of two-photon absorption (2PA) can be used to produce three-dimensional components with minimum structure widths of sub-100 nm. The optical precision is accompanied by demands on the precision of the measuring and positioning systems in order to enhance the state of the art of two-photon based laser writing. The nanopositioning and nano-measuring machines (NPM machines) developed at the TU Ilmenau enable highly accurate and metrologically traceable positioning with positioning resolutions of 0,1 nm and a repeatability of less than 1 nm. With a positioning range of 25 mm × 25 mm × 5 mm respectively 200 mm × 200 mm × 25 mm, the NPM machines scope completely new dimensions of cross-scale fabrication, so that micro- and sub-micron precision artifacts can be achieved in components with millimeter dimensions. In this thesis, the extension from NPM machines to manufacturing machines by combining them with 2PA laser writing is discussed. Therefore, a concept for the combination of the two-photon technology with an NPM-machine is developed and successfully realized. Subsequently, the system is characterized and specific investigations are done to confirm the synergy of both technologies. An analysis of the exposure dose was done and in various experiments, the applications of the high precision and large area structuring are shown. The potential of precise positioning is demonstrated by the groundbreaking results regarding small distances between two written lines beyond the diffraction limit. In addition, first tests for three-dimensional structuring of hybrid polymers showed the enormous potential for future complex 3D applications in a precision that has not been possible so far. Additionally, a new approach for high-throughput micro- and nanofabrication based on a combination of two-photon laser writing with field emission scanning probe lithography for the production of masters for nanoimprint lithography was developed.