Characterization of photoresist using speckle fields - a theoretical investigation

Gray scale lithography consists of numerous sophisticated fabrication steps making it necessary to characterize the process of substrate structuring. We expose the photoresist with random intensity, i.e. speckle fields instead of conventional specific test patterns and observe their behavior in Fourier plane caused by coherent illumination of this processed substrate.

Cite

Citation style:
Could not load citation form.

Rights

Use and reproduction:
All rights reserved

Export